基本释义:

电子波束曝光系统

网络释义

1)electron beam exposure system,电子波束曝光系统

2)electron beam lithography,电子束曝光

3)electron-beam lithography,电子束曝光

4)electron beam exposure,电子束曝光

5)electron beam direct-write exposure,电子束直写曝光

6)electron beam exposure machine,电子束曝光机

用法和例句

Research of figures with high aspect ratio made by electron beam lithography system;

利用电子束曝光系统制作高深宽比图形的研究

Studies of energy dissipation distribution in low-energy electron beam lithography by Monte Carlo method;

Monte Carlo方法研究低能电子束曝光沉积能分布规律

The paper presents the constitution features and experimental results of deflection system of the DY-5 electron beam exposure machine.

本文将重点介绍ＤＹ－５型电子束曝光机的偏转系统的构成、特点及结果。

In electron beam exposure machines the coincidence of three correspon-ding coordinate systems of stage movement, electro-magnetic deflection andmark is one of the important factors which affect pattern stitching accu-racy.

在电子束曝光机中，工件传动台、电磁偏转场及标记三者相对应的座标轴是否重合，是影响图形拼接精度的重要因素之一。

The wave trap is applied to measure the beam current in the electron beam exposure machine.

提出一种应用于电子束曝光机束流测量中的自动跟踪工频陷波器 ,给出电路结构 ,基于对其工作原理的分析 ,介绍了提高陷波器跟踪精度的设计要点及调试方

variable shaped electron beam exposure system

可变电子束曝光装置

The elementary exposure pattern of a variable rectangular electron beamexposure machine is a rectangle.

可变矩形电子束曝光机的基本曝光图形是矩形。

The E-beam Lithograpy Control System Based on VC++6.0

基于VC++6.0的电子束曝光控制系统

Study of Pattern Generator for Nanometer E-beam Lithography System;

纳米级电子束曝光系统用图形发生器技术研究

Research on Focusing-deflection System for Nanometer-scale Electron Beam Lithography Machine;

纳米级电子束曝光机聚焦偏转系统的研究

E-beam Lithography Stage Controller Design Based on FPGA

基于FPGA的电子束曝光机工件台控制器设计

Measurement System of Precision Stage for E-Beam Aligner

电子束曝光系统中精密工件台的测量系统

Rearch of Mark-Detection and Registration in Scanning-Electron-Beam Lithographic System;

扫描电子束曝光机背散射电子检测与对准技术的研究

APPLICATION OF PHASE-LOVKED METHOD IN CONSTANT SPEED CONTROL OF STAGE OF EB EXPOSURE MACHINE

锁相技术在电子束曝光机工件台稳速控制中的应用

The Research and Development of the Utility Program about Graphic Data Conversion for E-beam Lighography System;

可变矩形电子束曝光机图形数据转换软件的实用化研制

The composition,principle and working procedure of the application software of EBES-40A electron beam Lithography system are introduced.

本文简要地介绍了一种圆形电子束曝光机应用软件的结构、工作原理及工作过程；

electron beam projection exposure apparatus

电子束投影曝光装置

Research on Microchannel Fabrication of PCR Chip by Electron Beam Lithography Based on Overlapped Scanning

电子束重复曝光加工PCR微通道的工艺研究

The Research of Mark Signal Detection and Alignment Technology Used in High-energy Projection Electron Beam Lithography System with Demagnification Imaging (PELDI);

高能电子束缩小投影曝光机标记信号检测及对准技术的研究

raster scan electron beam lithography

光栅扫描电子束光刻

cinematographic film,sensitized bu no exposed

未曝光的感光电影胶片

cinematographic film, sensitized, unexposed

感光电影胶片,未曝光

vector scan electron beam lithography

矢量扫描电子束光刻