基本释义:

电子束加工，电刻

网络释义

1)E.B.M (electron beam machining),电子束加工，电刻

2)electron beam machining,电子束加工

3)Electron beam engraving,电子束雕刻

4)electron beam lithography,电子束光刻

5)electron beam lithography,电子束刻蚀

6)E-beam lithography,电子束光刻

用法和例句

Principle of electron beam lithography and its application on the nanofabrication and nanodevice;

电子束光刻技术的原理及其在微纳加工与纳米器件制备中的应用

Methods of proximity effect correction in electron beam lithography;

电子束光刻中邻近效应校正的几种方法

Application of chemically amplified resists in electron beam lithography;

化学放大胶在电子束光刻技术中的应用

For fabricating X-ray mask of high line-density X-ray transmission gratings,the field stitching of E-beam lithography was analyzed when patterning high line-density gratings;by using pattern correction and low sensitive 950 k PMMA resist,the proximity effect of electron beam was effectively depressed when exposing thick resist spun on polyimide membrane.

为了制备高线密度X射线透射光栅掩模,分析了电子束光刻中场拼接对高线密度光栅图形的影响;利用几何校正技术和低灵敏度的950 k的PMMA电子束抗蚀剂,克服了电子束的邻近效应对厚胶图形曝光的影响。

We present an all-e-beam lithography(EBL) process for the patterning of photonic crystal waveguides.

以光子晶体Fabry-Perot腔为例,提出了全电子束光刻制作光子晶体波导器件的解决方案。

raster scan electron beam lithography

光栅扫描电子束光刻

vector scan electron beam lithography

矢量扫描电子束光刻

electron chrome mask

电子束光刻用铬掩模

direct write electron beam system

直写式电子束光刻装置

raster scan electron beam system

光栅扫描电子束光刻系统

The Chemically Amplified Resist Composition and Its Lithography for Electronic Beam;

化学增幅光刻胶及其在电子束光刻中的应用

Study of Internal Proximity Effect Correction in Electron-Beam Lithograph

电子束光刻中的内部邻近效应校正技术研究

Electron-beam lithography with a novel multilevel resist structure defines the pattern.

采用新型的多层抗蚀剂结构的电子束光刻来形成图形。

Study of 3D Fabrication and Proximity Effect Technique in Electron Beam Lithography;

电子束光刻的三维加工和邻近效应校正技术研究

Study on Monte Carlo Simulation of Electron Beam Lithography and Proximity Effect Correction Technique;

电子束光刻的Monte Carlo模拟及邻近效应校正技术研究

Research on Electron Beam Nanolithogrpahy Based on AFM;

基于AFM的电子束纳米级光刻技术研究

The most prevalent procedure is to use photolithography or electron-beam lithography to produce a pattern in a layer of photoresist on the surface of a silicon wafer.

最常用的步骤是用光蚀刻或电子束蚀刻法，在矽晶圆表面的光阻层上制作出图案。

variable shaped electron beam exposure system

可变电子束曝光装置

electron-beam sustainer-pumped laser

电子束持续抽运激光器

electron beam projection exposure apparatus

电子束投影曝光装置

electron beam pumping semiconductor laser

电子束半导体激光器

cool beam low volatage electronic projective lamp

冷光束低压电子投影灯

The light photons, or bundle of light energy, knock electrons in the chromium atoms.

光子，即光能束，冲击铬原子中的电子。