基本释义:

刚蚀刻晶圆

网络释义

1)etching wafer,刚蚀刻晶圆

2)etched wafer,经蚀刻晶圆

3)wafer engraving,晶片刻蚀

4)etched ellipse,刻蚀椭圆痕

5)polysilicon over-etching,多晶硅刻蚀

6)lapping lapping wafer,刚磨光晶圆

用法和例句

The emission microscopy (EMMI) test is proposed as an effective method to control the polysilicon over-etching time of advanced CMOS processing combined with a novel test structure,named a poly-edge structure.

通过结合发光显微镜(EMMI)测试和poly-edge电容测试结构很好地控制了多晶硅刻蚀时间,避免了栅极氧化膜的早期失效。