基本释义:

批次间之注入均质性

网络释义

1)batch-to-batch dose uniformity,批次间之注入均质性

2)wafer-to -wafer dose uniformity,晶圆间离子值入之均质性

3)wafer dose uniformity,晶圆离子注入均质性

4)implantation homogeneity,注入均匀性

5)batch-to-batch consistency,批次间一致性

6)batch implantation,批注入

用法和例句

The implantation homogeneity of Type-100 MEVVA source ion implantor was therefore studied.

为此开展了100型MEVVA源注入机大批量的工件注入均匀性的研究。

Along with the development of integrated circuit,the traditional batch implantation has already can t satisfy a current process,the single wafer implantation with the mechanical scanning solved the technique problem,also controlling the cost risk,having a series of advantage of higher accuracy,less contamination etc,becoming the current high level ion implanter the best choice.

随着集成电路工艺技术的提高,对离子注入提出更高的要求,传统的批注入已不能满足当前的工艺,从而开发出了适应当前工艺的单晶片注入的机械扫描技术。