基本释义:

印网掩模

网络释义

1)screen mask,印网掩模

2)screened solder mask,丝网印制钎焊掩模

3)photomask copy,光掩模复印

4)cover net,throw net ,trow net,掩网

5)mask,掩模

6)maskless printing,无掩膜印刷

用法和例句

Multilayers on Extreme Ultraviolet Lithography Masks and Illumination Error;

极紫外投影光刻掩模的多层膜与照明误差

Fabrication of continuous relief mask for diffractive plane focus lens;

连续型平面衍射聚光透镜掩模的制作

A Novel GMTI Method Based on Masking Technique;

一种利用掩模法抑制杂波的GMTI方法

mask programmable integration

掩模可编程序集成电路

Hard surface photomask substrates

GB/T15871-1995硬面光掩模基板

electron beam generated mask

电子束技术制造的掩模

hard-surface in-contact mask

表面坚固内接触掩模

electron beam mask generator

电子束掩模图象发生器

mask program read-only memory

掩模程序只读存储器

photoresist mask pattern

光致抗蚀剂掩模图形

electron beam mask system

电子束掩模制造系统

mask programmable memory

掩模可编程序存储器

trench mask definition

槽腐蚀用掩模图象形成

electron chrome mask

电子束光刻用铬掩模

masking clean / etch statio

掩模板清洗[腐蚀]台

fixed-mask type ROM

固定掩模型只读存储器

computer aided mask preparation

计算机辅助掩模制备

Chromium masks last1 o to100 times longer than the emulsion masks.

铬掩模的使用寿命比乳效掩模的长10~00倍.

Chromium masks last 1o to 100 times longer than the emulsion masks.

铬掩模的使用寿命比乳效掩模的长10~100倍.

Act of moving a mask or reticle to match up alignment marks.

对准,调整掩模和晶片之间的位置。

Specification for round quartz photomask substrates

GB/T16523-1996圆形石英玻璃光掩模基板规范