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1)mocvd reactor,Óлú½ðÊô»¯Ñ§ÆûÏàµí»ý·´Ó¦Æ÷

2)mocvd,Óлú½ðÊô»¯Ñ§ÆûÏàµí»ý

3)plasma-assisted metal-organic chemical vapor deposition,µÈÀë×ÓÌå½ðÊôÓлúÎﻯѧÆûÏàµí»ý

4)MOCVD,½ðÊôÓлúÎﻯѧÆûÏàµí»ý

5)chemical vapor deposition reactor,»¯Ñ§ÆûÏàµí»ý·´Ó¦Æ÷

6)MOCVD,½ðÊôÓлú»¯Ñ§ÆøÏàµí»ý

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ZnO films have been grown on C-plane sapphire substrate with the plasma-assisted metal-organic chemical vapor deposition (MOCVD) method.

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metallo organic chemical vapor deposition

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photochemical vapor deposition oxide

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Simulation and optimization design in MOCVD reactor

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cvd polysilicon

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plasma chemical vapor deposition

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modified chemical vapor deposition

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chemical vapor deposition reactor

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The Praparation and Chemical Mechanism of Functional Graded Materials Using Metal Organic Chemistry Vapour Deposition;

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Research on Preparing Yttria Coatings by Metalorganic Chemical Vapor Deposition;

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Growth of ZnO Films on Different Substrates by Metal Organic Chemical Vapor Deposition

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Iridium Film Prepared by Metal-Organic Chemical Vapor Deposition

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Metal Organic Chemical Vapor Deposition( MOCVD) is a key technology in growing thin-films.

½ðÊôÓлú»¯Ñ§ÆøÏà³Á»ý(OCVD)Ò»ÃÅÖƱ¸±¡Ä¤²ÄÁϵĹؼü¼¼Êõ¡£

Synthesis and Characterization of Novel Copper£¨¢ñ£©Complexes as Precursors for Metal-Organic Chemical Vapor Deposition;

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A New Preparation Technology of Mica Pearlescent Pigment by Metal Organic Chemistry Vapour Deposition (MOCVD) and Their Application;

½ðÊôÓлú»¯Ñ§ÆøÏà³Á»ý£¨MOCVD£©·¨ÖƱ¸ÔÆĸÖé¹âÑÕÁÏй¤ÒÕ¼°Ó¦ÓÃÑо¿

The triangular pits eliminate of (11ªÖ0) a-plane GaN growth by metal-orgamic chemical vapor deposition

½ðÊôÓлúÎﻯѧÆøÏà³Á»ýÉú³¤µÄa(11ªÖ0)ÃæGaNÈý½Ç¿ÓȱÏݵÄÏû³ýÑо¿

A novel high reflectivity type of semiconductor saturable absorption mirror grown by metal organic chemical vapor deposition is presented.

ÀûÓýðÊôÓлúÆøÏàµí»ý·½·¨Éú³¤ÁËÒ»ÖÖÐÂÐÍÎüÊÕÌå:¸ß·´ÉäÂÊ°ëµ¼Ìå¿É±¥ºÍÎüÊÕ¾µ.

Studies of Metal Oxides Film Synthesized by Themal Vapor Phase Transport and Condensation;

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thermochemistry of organometallic compounds

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