基本释义:

正性胶光刻

网络释义

1)positive resist lithography,正性胶光刻

2)polymeric material for optical process,正性光刻胶

3)ultraviolet positive photoresist,紫外正性光刻胶

4)positive resist,正型光刻胶

5)positive micromolecule photosensitizer,正性小分子光刻胶

6)deep ultraviolet positive photoresist,远紫外正性光刻胶

用法和例句

Then it is exposured under HP mercury lamp and developed by 20% NaOH solution,which proves the feasibility of preparing positive micromolecule photosensitizer using 2-nitrobenzyl alcohol as photosensitive module.

以硬脂酸、邻硝基苄醇为原料,合成了硬脂酸邻硝基苄酯,并在高压汞灯下曝光、显影,证明了以邻硝基苄醇作为光敏基元制备正性小分子光刻胶的可行性。

Study of a UV Positive Photoresist and Photoacid Generators for 248nm Deep-UV Photoresist;

紫外正型光刻胶及248nm产酸剂的研制

Development of a High ThermoStability UV Positive Photoresist and a 248nm Deep-UV Photoresist;

耐高温紫外正型光刻胶和248nm深紫外光刻胶的研制

Optical Radiative Transition Characteristics of Eu(TTFA)_3-Doped Resin Photoresist Polymer Film

树脂型光刻胶薄膜中Eu~(3+)的辐射跃迁特性

photoresist controlled etch

光刻胶掩蔽控制腐蚀

Research of SU-8 Resist Lithography Using Ultraviolet Laser;

紫外激光曝光光刻SU-8胶的工艺研究

The Chemically Amplified Resist Composition and Its Lithography for Electronic Beam;

化学增幅光刻胶及其在电子束光刻中的应用

Optical properties and process of the diluted SU8 resist

改性SU8光刻胶的光学特性及其工艺

Two-spectrum Method for Measuring the Thickness of Photoresist in Lithography Techniques

双光谱法实现光刻工艺中的胶厚检测

Study on Synthesis of Photoresist and Photochemical Process for Information Recording in Laser Disc

激光光盘信息记录光刻胶的合成与感光

Fundamentals and Lithographie Technology Based on Pulse Laser Exposing SU-8 Photoresist;

脉冲激光曝光SU-8胶的基础与光刻技术研究

This photoresist have thermal stabilityand high resolution.

该光刻胶具有热稳定性和高分辨率性。

photoresist edge build up

硅片边缘上光刻胶的积累

ozone induced scumming

臭氧感生未显影光刻胶形成

Research on Theory and Experiment of UV-Lithography on SU-8 Photoresist;

SU-8胶紫外光刻理论与实验研究

Experimental Study on Ultrasonic Stress Relief Used in SU-8 Photoresist;

SU-8光刻胶超声时效的实验研究

positive film stock

生正片(未曝光的胶片)

Aqueous-soluble Hyperbanched Polyesters: Snthesis and Photoresists for Microoptics;

高支化碱溶性聚酯的合成及其微光学光刻胶

Profile Control and Detection of Holographically Recorded Photoresist Grating Masks;

光刻胶全息光栅掩模槽形的控制和检测