基本释义:

直写式电子束光刻

网络释义

1)direct write electron beam lithography,直写式电子束光刻

2)direct write electron beam system,直写式电子束光刻装置

3)electron beam direct-writing lithography,电子束直写光刻

4)electron beam direct-write exposure,电子束直写曝光

5)electron beam direct writing,电子束直写

6)electron beam lithography,电子束光刻

用法和例句

Patterned media with nickel nanopillar arrays as the magnetic recording units was prepared with electron beam direct-writing lithography and electrodeposition.

以电子束直写光刻图形为模版,采用直流电沉积和数值模拟的方法,研究了镍纳米柱阵列图案化磁记录介质的制备工艺和模版电沉积过程中的沉积不均匀问题。

Based on the analysis, a new method is presented to fabricate the BSG with electron beam direct writing.

并在此基础上 ,采用电子束直写加工光栅掩模 ,制作取样光栅。

The mold manufacturing is the key part in imprint lithography process, which includes electron beam direct writing, stepping molding, and the conversion from small mold to big mold.

采用电子束直写、步进制模、压印翻制的压印模具生产工艺 ,其模具的制造是目前面临的难点。

Principle of electron beam lithography and its application on the nanofabrication and nanodevice;

电子束光刻技术的原理及其在微纳加工与纳米器件制备中的应用

Methods of proximity effect correction in electron beam lithography;

电子束光刻中邻近效应校正的几种方法

Application of chemically amplified resists in electron beam lithography;

化学放大胶在电子束光刻技术中的应用

direct write electron beam system

直写式电子束光刻装置

raster scan electron beam lithography

光栅扫描电子束光刻

vector scan electron beam lithography

矢量扫描电子束光刻

electron chrome mask

电子束光刻用铬掩模

well-collimated beam

直线状注流，良好准直光束[电子束]

raster scan electron beam system

光栅扫描电子束光刻系统

The Chemically Amplified Resist Composition and Its Lithography for Electronic Beam;

化学增幅光刻胶及其在电子束光刻中的应用

Research on Electron Beam Nanolithogrpahy Based on AFM;

基于AFM的电子束纳米级光刻技术研究

Preparation of Patterned Media with Electron Beam Direct-Writing Lithography and Electrodeposition

电子束直写模版电沉积制备图案化磁记录介质

Study of Internal Proximity Effect Correction in Electron-Beam Lithograph

电子束光刻中的内部邻近效应校正技术研究

Fabricating Micro-grating Structures on Nickel Using Interference Laser

镍金属表面双光束激光干涉直写研究

The most prevalent procedure is to use photolithography or electron-beam lithography to produce a pattern in a layer of photoresist on the surface of a silicon wafer.

最常用的步骤是用光蚀刻或电子束蚀刻法，在矽晶圆表面的光阻层上制作出图案。

Electron-beam lithography with a novel multilevel resist structure defines the pattern.

采用新型的多层抗蚀剂结构的电子束光刻来形成图形。

Study of 3D Fabrication and Proximity Effect Technique in Electron Beam Lithography;

电子束光刻的三维加工和邻近效应校正技术研究

Study on Monte Carlo Simulation of Electron Beam Lithography and Proximity Effect Correction Technique;

电子束光刻的Monte Carlo模拟及邻近效应校正技术研究

High Precision Laser Direct Writing System for Micro-optical Device;

高精度微光学器件激光直写光刻系统研究

Fabrication of Micro-grating Structures by Nanosecond Laser Ablation of Chrome Film on Glass Substrate

纳秒激光刻蚀玻璃基质铬薄膜直写微光栅结构

variable shaped electron beam exposure system

可变电子束曝光装置