基本释义:

直列式离子溅射装置

网络释义

1)in line sputterer,直列式离子溅射装置

2)diode sputter,两电极离子溅射装置

3)ion sputtering,离子溅射

4)ion-beam sputtering,离子束溅射

5)Ar ion sputtering effect,Ar离子溅射

6)ion-beam sputter,离子束溅射

用法和例句

Application of ion sputtering in plasma nitriding of austenitic stainless steel

离子溅射在奥氏体不锈钢离子渗氮中的应用

Effect of ion sputtering platinum on photocatalytic degradation of ethylene in the environment of cold storage

离子溅射Pt对光催化降解冷藏环境中乙烯的影响

Silicate substrates were coated by ion sputtering with nickel,and then used to catalyze the decomposition of low hydrocarbons to prepare the relatively well distributed carbon nanotubes films(CNFs).

1　实验部份1 1　镀膜与后处理采用离子溅射法在硅酸盐基板上镀镍,镀镍电流7 5mA,镀镍时间分别为2min、15min、30min、45min或60min;对镀镍基板再进行蚀刻(蚀刻电流7 5mA,蚀刻时间2min)或用氨水浸泡处理(含NH325%,超声振荡30min),然后烘干备用。

Si/Ge multilayer films were prepared by ion-beam sputtering.

采用离子束溅射制备Si/Ge多层膜,通过X射线小角衍射计算其周期厚度及各子层的厚度,用Raman光谱对Si/Ge多层膜的微观结构及Si子层的结构进行表征。

Si/Ge multilayer films have been prepared by ion-beam sputtering on glass substrates with different periods.

采用离子束溅射技术,在玻璃衬底上制备了不同周期数的Si/Ge多层膜样品。

A series of AgNiMnGa nano-granular films with different combinations of component materials were fabricated by using ion-beam sputtering technique.

利用离子束溅射技术制备了AgNiMnGa颗粒膜的系列样品。

Polymer fluorocarbon films on polyester were prepared under various discharge conditions by ion-beam sputtering and characterized by using XPS.

在不同放电条件下利用离子束溅射法制备了聚酯膜基底上的氟碳高分子膜 。

The LSCO films which on yttria-stabilized zirconia(YSZ) andaluminates lanthanum (LaAlO_3)were obtained by ion-beam sputtering method.

本论文采用离子束溅射工艺在氧化钇稳定的氧化锆(YSZ)和铝酸镧(LaAlO_3)衬底上制备La_(0。

in line sputterer

直列式离子溅射装置

Sandwich Type Distributed Sputtering Ion Pump with φb 6 mm Anode Holes

Φ6毫米阳极孔层状分布式溅射离子泵

microprocessor automated sputterer

微处理曝制的溅射装置

the emitting positions of the sputtered atoms are close to the corresponding incident ions (in the order of angstrom);

溅射原子的出射位置就在离子入射位置的附近(埃数量级);

diode sputter-ion pump

二极管溅射离子泵[抽机]

plasma sputter combined etching

等离子溅射复合刻蚀

KEYWORDS: GIMS, ion source, anode layer, sputtering, TiN, ion plating， medium frequency, pulsed DC.

中文关键词：气离溅射、子源、极层流、射、化钛、子镀膜、频、冲直流。

direct write electron beam system

直写式电子束光刻装置

continuous belt ion exchange system

连续带式离子交换装置

vertical incidence ionosonde

垂直投射电离层探测装置

Controlled fabrication of Si nanocones by using diamond film as a mask under ion beam sputtering

金刚石薄膜为掩膜离子束室温溅射可控制备硅纳米圆锥阵列

The Calculation of Electromagnetic Distribution and Particle Movement in Magnetron Sputtering Equipment;

磁控溅射装置中电磁场分布及粒子运动行为的计算分析

Software Design of Real-time Monitoring System of Unbalanced Magnetron Sputtering Ion-plating Equipment in Closed Field;

闭合场非平衡磁控溅射离子镀装备实时监控系统软件设计

THE SIMULATION RESEARCH ON ENERGY LOSS AND RANGE OF SPUTTERING IONS

离子溅射能量损失及射程的模拟研究

APPLICATION OF MAGNETIC MIRROR IN DIRECT COUPLER MPCVD DIAMOND FILMS DEVICE

磁镜场在直接耦合式微波等离子体CVD金刚石膜装置中的应用

Computer Simulation of the Transportation and the Sputtering of Ions in RF Magnetron Sputtering;

射频磁控溅射镀膜过程中离子输运和溅射行为的模拟计算

low pressure triode method

低压三极管离子溅射方法

Research on Carbon Nitride Films Prepared by Ion Beam Sputtering;

离子束溅射法制备C-N薄膜的研究