基本释义:

直写式电子束光刻装置

网络释义

1)direct write electron beam system,直写式电子束光刻装置

2)direct write electron beam lithography,直写式电子束光刻

3)electron beam direct-writing lithography,电子束直写光刻

4)electron beam direct-write exposure,电子束直写曝光

5)electron beam direct writing,电子束直写

6)electron beam lithography,电子束光刻

用法和例句

Patterned media with nickel nanopillar arrays as the magnetic recording units was prepared with electron beam direct-writing lithography and electrodeposition.

以电子束直写光刻图形为模版,采用直流电沉积和数值模拟的方法,研究了镍纳米柱阵列图案化磁记录介质的制备工艺和模版电沉积过程中的沉积不均匀问题。

Based on the analysis, a new method is presented to fabricate the BSG with electron beam direct writing.

并在此基础上 ,采用电子束直写加工光栅掩模 ,制作取样光栅。

The mold manufacturing is the key part in imprint lithography process, which includes electron beam direct writing, stepping molding, and the conversion from small mold to big mold.

采用电子束直写、步进制模、压印翻制的压印模具生产工艺 ,其模具的制造是目前面临的难点。

Principle of electron beam lithography and its application on the nanofabrication and nanodevice;

电子束光刻技术的原理及其在微纳加工与纳米器件制备中的应用

Methods of proximity effect correction in electron beam lithography;

电子束光刻中邻近效应校正的几种方法

Application of chemically amplified resists in electron beam lithography;

化学放大胶在电子束光刻技术中的应用

direct write electron beam system

直写式电子束光刻装置

variable shaped electron beam exposure system

可变电子束曝光装置

electron beam projection exposure apparatus

电子束投影曝光装置

raster scan electron beam lithography

光栅扫描电子束光刻

vector scan electron beam lithography

矢量扫描电子束光刻

electron chrome mask

电子束光刻用铬掩模

vector scan electron beam system

矢量扫描电子束装置

well-collimated beam

直线状注流，良好准直光束[电子束]

raster scan electron beam system

光栅扫描电子束光刻系统

The Chemically Amplified Resist Composition and Its Lithography for Electronic Beam;

化学增幅光刻胶及其在电子束光刻中的应用

in line sputterer

直列式离子溅射装置

Research on Electron Beam Nanolithogrpahy Based on AFM;

基于AFM的电子束纳米级光刻技术研究

electronically scanned optical tracker

电子扫描光学跟踪装置

laser-EDP setup

激光电子数据处理装置

A device for converting heterogeneous beam of radiation (elec tromagnetic or particulate) to homogeneous beam by absorption or refraction of unwanted components.

利用吸收或折射掉不需要的成分,把非单色光束(电磁的或粒子的)变成单色光束的装置。

Consider a beam of electrons impinging upon a double slit apparatus.

设有一束电子射向一个双缝装置。

A device that interrupts an electric current or a beam of radiation.

断路器或斩光器截断电流或光束的一种装置

The operation involves placing electrical devices directly on the brain.

手术是将电子装置直接装入脑部。