基本释义:

自显影光刻胶

网络释义

1)self developing resist,自显影光刻胶

2)develop check,光刻胶显影检查

3)photoresist developer,光刻胶显影剂

4)resist scum,未显影光刻胶

5)lithography development,光刻显影

6)developer for negative resist,负型光刻胶显影剂

用法和例句

Meanwhile,a model for lithography development based on the Dill algorithm,the Kim model and the ray algorithm is established.

为此提出基于层次结构的三维场景绘制点渲染算法,并引入网格插值法填补显影模拟中在光刻胶表面出现的空洞,用Dill算法、Kim模型和介质光线算法建立光刻显影模型。

ozone induced scumming

臭氧感生未显影光刻胶形成

cinematographic film, sensitized, exposed, not developed

感光电影胶片,已曝光未显影

film for photoelectric sound recording, sensitized, exposed, not developed

光电录音用感胶片,已曝光,未显影

photographic film, sensitized, exposed, not developed

照相感光胶片,已曝光未显影

Simulation and experiments of monitoring curves on development of holographically recorded photoresist gratings

光刻胶全息光栅显影监测的模拟与实验

cinematographic film,sensitized bu no exposed

未曝光的感光电影胶片

cinematographic film, sensitized, unexposed

感光电影胶片,未曝光

Simulation of Point Based Rendering for Three Dimensional Lithography Development

用点渲染算法实现光刻胶显影过程的三维模拟(英文)

microfilm exposed and developed

缩微胶片,已曝光和显影

In microelectronics, the process of removing material, on a chip, left exposed by the exposure and development of the photoresist.

在微电子技术中,通过曝光并显影光刻胶除去芯片上的物质露出剩余部分的工艺。

photographic film, exposed and developed, for offset reproduction

照相胶片,已曝光和显影胶印印件用

roentgen films,sensitized but not exposed

未曝光X光感光胶片

photoresist controlled etch

光刻胶掩蔽控制腐蚀

photographic sensitized film, unexposed

照相感光胶片纸,未曝光

Influence of Fluorescent Glue Packaging Technology on the Color Rendering Index of High Power LED

大功率LED荧光胶封装工艺对其显色性能的影响

To form the images, one simply projects laser light through the developed film.

为了显象、我们只要使激光射过已显影的胶片就可。

Research of SU-8 Resist Lithography Using Ultraviolet Laser;

紫外激光曝光光刻SU-8胶的工艺研究

The influence of recording conditions on the signal-to-noise ratio of retrieved images for photoresist Fourier transform holograms

光刻胶傅里叶全息图的记录条件对重构图像信噪比的影响