基本释义:

氧化硅

网络释义

1)silica,氧化硅

2)silicon oxide,氧化硅

3)silicon dioxide,氧化硅

4)SiOx,氧化硅

5)SiO_2,氧化硅

6)silicon/silicon oxide,硅/氧化硅

用法和例句

Synthesis of silica/polystyrene monocore-shell nanocomposite particles via miniemulsion polymerization;

细乳液法合成单核核壳结构氧化硅/聚苯乙烯复合微球

Study on the preparation and properties of polyimide/silica/alumina nano-composite film;

聚酰亚胺/氧化硅/氧化铝纳米复合薄膜的制备及性能研究

Preparation and Characterization of Silica-modified Titanium Dioxide Nanoparticles by Co-precipitation Method;

共沉淀法制备氧化硅改性的纳米二氧化钛及其性质

This paper describes the study on the component and structure of the silicon oxide and silicon nitride films by infra-red absorbed spectrum.

利用红外吸收谱等微观分析对氧化硅和氨化硅薄膜的成分和结构进行了研究。

In this paper, the silicon oxide films were deposited on quartz substrate by radio-frequency (RF) reactive magnetron sputtering method, the influences of radio-frequency power, oxygen concentration and sputtering pressure on the deposition rate of the silicon oxide film was investigated.

氧化硅薄膜是半导体工业中常见的薄膜材料,通常采用化学气相沉积方法制备。

Using 3-mercaptopropyltrimethoxysilane as linker, single gold nanoparticle was successfully encapsulated by silicon oxide shell, and Au@SiO2 core-shell nanoparticles were prepared.

采用3-巯基丙基三甲氧基硅烷作为联结剂,成功将单个金纳米粒子包在氧化硅壳中,制得Au@SiO2核壳纳米粒子;该复合纳米粒子形貌呈球形、单分散性较好,金纳米粒子位于氧化硅球的中心,无团聚的金纳米粒子包覆在氧化硅壳中。

The optimum conditions are defined: citric acid ∶maleic acid=1∶1, nano silicon dioxide 0.

给出的最 佳工艺条件为:柠檬酸∶马来酸酐=1∶1,纳米二氧化硅浓度为0。

Preparation of SiOx Film and its Barrier Performance to Steam;

氧化硅阻隔膜的制备及对水蒸气的阻隔特性研究

Mass spectrometry diagnosis in SiOx coating grown by PECVD plasma

等离子增强化学气相沉积制备氧化硅薄膜的质谱诊断研究

The characterization of SiOx film deposited on PET substrates by plasma enhanced chemical vapor deposition(PECVD) with 40kHz mid-frequency pulse power source as a transparent barrier layer was investigated.

采用40kHz中频脉冲电源,利用电容耦合等离子体增强化学气相沉积(PECVD)技术,以六甲基二硅氧烷(HMDSO)为单体、氧气为反应气体,氩气为辅助气体,在PET薄膜表面沉积应用于透明高阻隔包装的氧化硅薄膜,并对其进行研究。

Accurate Measurements of the Oxide Thickness for Ultra-thin SiO_2 on Si by using XPS;

用XPS法精确测量硅片上超薄氧化硅的厚度

dioxide polysilicon isolation

二氧化硅 多晶硅隔离

colloided silica

胶态硅石，胶态氧化硅

Electroluminescence from a Mn~(2+) Activated SiO_2:Si Film on n~+-Si Substrate

硅基掺锰富硅氧化硅薄膜的电致发光

calcia-alumina-silica fibre

氧化钙-氧化铝-氧化硅纤维

baria-alumina-silica fibre

氧化钡-氧化铝-氧化硅纤维

muffle of fused silica

隔焰罩,熔凝氧化硅制

full isolation by porous oxidized silicon

多孔氧化硅完全隔离

Silica-on-Silicon Array Waveguides Gratings;

硅基二氧化硅型阵列波导光栅的研制

Modification of Porous Silica Antireflective Coatings with Fluorine-Containing Organosilicon

含氟有机硅改性多孔二氧化硅减反膜

Study on effect of porous silica prepared from wollastonite as reinforcer in silastic

硅灰石制多孔二氧化硅在硅橡胶中的应用研究

Determination of silicon oxide in silica fume by molybdosilicate yellow spectrophotometry

硅钼黄分光光度法测定硅微粉中二氧化硅

Synthesis of Three-dimensional Dense Silicon Oxycarbide Ceramics by Pyrolysis of Polysiloxanes;

聚硅氧烷热解合成三维致密碳氧化硅陶瓷

Preparation of Thin SiO_2 Films from Polysilane Coatings Using Oxygen Plasma Method;

氧等离子体处理聚硅烷涂层制备二氧化硅薄膜

Silica-supported Karstedt-type Catalyst for Hydrosilylation Reactions;

二氧化硅负载Karstedt催化剂催化硅氢化反应的研究

MODIFICATION BY VAPOR SILYLATION OF NIOBIUM-CONTAINING HEXAGONAL MESOPOROUS SILICA

含铌六方介孔二氧化硅的气相硅烷化改性(英文)

Study on Silicon Dioxide Powders Prepared by Silicon Tetrachloride

四氯化硅为原料制备二氧化硅粉体的研究

The main components of crystal is SIO2, ultra-high purity SIO2 is called “Crystal”.

水晶的化学成份为二氧化硅，高纯度的二氧化硅即称为“水晶”。

XRF Measurement of SiO_2、CaO、MgO and Al_2O_3 in Coal and Coke

X荧光法测定煤、焦炭中的二氧化硅、氧化钙、氧化镁、氧化铝